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Our family of high temperature Quartz Baths are designed for etching, cleaning, and stripping. They are commonly used for resist strip, silicon nitride etch, RCA clean, etc. Our baths are manufactured with a high temperature sealant filled labyrinth to prevent liquid intrusion to the heater and the flange is sloped to divert run-off away from the seal.
Standard features include: -
+/- 1șC temperature control when used with our microprocessor controller.
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Operating temperature range of 30șC to 200șC.
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Available in sizes compatible with 4", 5", 6" or 8" wafers in one or two carriers.
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Constructed as a one piece seamless process vessel.
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Redundant built in over temperature cut-out.
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Teflon protected power cord with flexible outer conduit.
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